Nd: YVO4 laser crystallization for thin film transistors with a high mobility

Materials Research Society Symposium-Proceedings

Volumn 621, Issue , 2000, Pages Q931-Q936

  Dassow, Ralf ^a   Köhler, Jürgen R ^a   Nerding, Melanie ^b   Strunk, Horst P ^b   Helen, Youri ^c   Mourgues, Karine ^c   Bonnaud, Olivier ^c   Mohammed Brahim, Tayeb ^c   Werner, Jürgen ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^c UNIVERSITÉ DE RENNES 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; NEODYMIUM LASERS; POLYSILICON; SOLIDIFICATION;

GRAIN SIZE DISTRIBUTION;

THIN FILM TRANSISTORS;

EID: 0034428488     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-621-q9.3.1     Document Type: Article

References (10)