TFT annealing with excimer laser. Technology and market outlook

Physica Status Solidi (A) Applied Research

Volumn 166, Issue 2, 1998, Pages 743-749

  Staudt, W ^a   Borneis, S ^a   Pippert, K D ^a  

^a Lambda Physik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; EXCIMER LASERS; LASER APPLICATIONS; LASER BEAMS; LIQUID CRYSTAL DISPLAYS; MELTING; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

EXCIMER LASER ANNEALING (ELA);

THIN FILM TRANSISTORS;

EID: 0032049350     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199804)166:2<743::AID-PSSA743>3.0.CO;2-H     Document Type: Article

References (0)