Excimer laser treatment for large surface

Journal of Non-Crystalline Solids

Volumn 218, Issue , 1997, Pages 218-222

  Stehle, Marc ^a  

^a SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELLIPSOMETRY; EXCIMER LASERS; LASER APPLICATIONS; PROCESS CONTROL; SPECTROSCOPIC ANALYSIS; SURFACE TREATMENT;

LASER ANNEALING;

AMORPHOUS SILICON;

EID: 0031549374     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00293-7     Document Type: Article

References (4)

1. B. Godard, M. Stehle, J. Bonnet, D. Pigache, Realization of a 1 kW XeCl Laser, GCL'92, Sept. 1992, SPIE 1810 Gas Flow and Chemical Lasers 372, Heraklion, Greece.
2. B. Godard, P. Murer, M. Stehle, J. Bonnet, D. Pigache, VEL 15, Second Generation of SOPRA's VEL industrial Excimer Laser, energy up to 20 J, July 1995, CLEO/Pacific Rim Conference, Japan.
3. B. Godard, P. Laborde, C. Dutems, S. Prochasson, D. Zahorski, M. Stehle, 60 J XeCl laser for Single Shot Excimer Laser Annealing, August 1996, GCL'96, Edinburgh, Scotland.
4. P. Boher, J.-L. Stehle, M. Stehle, B. Godard, Excimer Laser Annealing of Amorphous Silicon: Optimization and relation to the electrical properties of the polysilicon, EMRS Spring Meeting, USA, 1996.