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edited by D. Fichou (Wiley, Weinheim)
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Weinheim, Ger.
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H. E. Katz, A. Dodabalapur, and Z. Bao, in Oligo- and Polythiophene-Based Field-Effect Transistors, edited by D. Fichou (Wiley, Weinheim, 1998); G. Horowitz, Adv. Mater. (Weinheim, Ger.) 10, 365 (1998); F. Garnier, Chem. Phys. 227, 253 (1998); H. E. Katz and Z. Bao, J. Phys. Chem. B 104, 671 (2000); C. D. Dimitracopoulos and P. R. L. Malenfant, Adv. Mater. (Weinheim, Ger.) 14, 99 (2002).
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Y.-Y. Lin, D. J. Gundlach, S. F. Nelson, and T. N. Jackson, IEEE Trans. Electron Devices 44, 1325 (1997); H. Klauk, D. J. Gundlach, J. A. Nichols, and T. N. Jackson, ibid. 46, 1258 (1999).
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0242479383
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note
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Since the studied devices are p-type FETs, we reserve the term "source" for an electrode that is biased positively and injects holes, while the grounded electrode is called the "drain."
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19
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0242479384
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note
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SD→0.
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20
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0242395947
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note
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-3 is the bulk concentration of traps, and d is the effective channel thickness (≤10 nm). The corresponding threshold voltage, associated with the bulk traps in the studied devices, is therefore very small (<0.1 V).
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21
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0033353420
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Weinheim, Ger.
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C. D. Dimitracopoulos, I. Kymissis, S. Purushothaman, D. A. Neumayer, P. R. Duncombe, and R. B. Laibowitz, Adv. Mater. (Weinheim, Ger.) 11, 1372 (1999).
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Neumayer, D.A.4
Duncombe, P.R.5
Laibowitz, R.B.6
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23
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0034504597
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A. B. Chwang and C. D. Frisbie, J. Phys. Chem. B 104, 12202 (2000); P. V. Necliudov, M. S. Shur, D. J. Gundlach, and T. N. Jackson, Solid-State Electron. 47, 259 (2003); J. Zaumseil, K. W. Baldwin, and J. A. Rogers, J. Appl. Phys. 93, 6117 (2003).
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0037290286
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Necliudov, P.V.1
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0038650905
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A. B. Chwang and C. D. Frisbie, J. Phys. Chem. B 104, 12202 (2000); P. V. Necliudov, M. S. Shur, D. J. Gundlach, and T. N. Jackson, Solid-State Electron. 47, 259 (2003); J. Zaumseil, K. W. Baldwin, and J. A. Rogers, J. Appl. Phys. 93, 6117 (2003).
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Zaumseil, J.1
Baldwin, K.W.2
Rogers, J.A.3
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26
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0242647731
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note
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SD.
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