Evaluation of residual stress in MEMS structures by Digital Holography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4933, Issue , 2003, Pages 226-231

  Coppola, Giuseppe ^a   De Nicola, Sergio ^b   Ferraro, Pietro ^a   Finizio, Andrea ^b   Grilli, Simonetta ^c   Iodice, Mario ^a   Magro, Carlo ^d   Pierattini, Giovanni ^b  

^a CNR   (Italy)

^b CNR   (Italy)

^c ISTITUTO NAZIONALE DI OTTICA   (Italy)

^d STMICROELECTRONICS   (Italy)

Author keywords

Digital Holography; MEMS; Residual stress

Indexed keywords

COMPUTER GENERATED HOLOGRAPHY; COMPUTER SIMULATION; DEFORMATION; FINITE ELEMENT METHOD; MICROSTRUCTURE; POLYSILICON; RESIDUAL STRESSES;

BIMORPH STRUCTURES;

MICROELECTROMECHANICAL DEVICES;

EID: 0242469118     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.516637     Document Type: Conference Paper

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