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Volumn 212, Issue 1-4, 2003, Pages 258-263

Bombardment-induced ripple topography on GaAs and InP

Author keywords

Bombardment induced ripples; Gallium arsenide (GaAs); Indium phosphide (InP); Ion bombardment; Nano technology; Surface diffusion; Surface morphology; Topography

Indexed keywords

ACTIVATION ENERGY; CRYSTALLOGRAPHY; DIFFUSION; MORPHOLOGY; NANOTECHNOLOGY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SURFACE TOPOGRAPHY;

EID: 0242332355     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)01454-X     Document Type: Conference Paper
Times cited : (14)

References (37)
  • 25
    • 30844443723 scopus 로고
    • A. Benninghoven, K.T.F. Janssens, J. Tümpner, & H.W. Werner. Chichester: Wiley
    • Gries W.H. Benninghoven A., Janssens K.T.F., Tümpner J., Werner H.W. Proc. SIMS VIII. 1991;323 Wiley, Chichester.
    • (1991) Proc. SIMS , vol.8 , pp. 323
    • Gries, W.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.