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Volumn , Issue , 2002, Pages 428-435

Effect of recess length on DC and RF performance of gate-recessed AlGaN/ GaN HEMTs

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ELECTRIC BREAKDOWN; GALLIUM NITRIDE; LEAKAGE CURRENTS; MICROWAVES; OHMIC CONTACTS;

EID: 0242302472     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (6)

References (9)
  • 3
    • 0001668519 scopus 로고    scopus 로고
    • Gate leakage current mechanism in AlGaN/GaN heterostructure field-effect transistors
    • E.J. Miller, X.Z. Dang, E.T. Yu, "Gate leakage current mechanism in AlGaN/GaN heterostructure field-effect transistors", J Appl Phys 2000, vol. 88, No. 10, pp. 5951-58.
    • (2000) J Appl Phys , vol.88 , Issue.10 , pp. 5951-5958
    • Miller, E.J.1    Dang, X.Z.2    Yu, E.T.3
  • 4
    • 0000588930 scopus 로고    scopus 로고
    • The effect of surface passivation and illumination on the device properties of AlGaN/GaN HFETs
    • B.J. Ansell, I. Harrison, C.T. Foxon, "The effect of surface passivation and illumination on the device properties of AlGaN/GaN HFETs", Phys Stat Sol A 2001, vol. 188, No. 1, pp. 279-282.
    • (2001) Phys Stat Sol A , vol.188 , Issue.1 , pp. 279-282
    • Ansell, B.J.1    Harrison, I.2    Foxon, C.T.3
  • 5
    • 79956026601 scopus 로고    scopus 로고
    • Gate Leakage effects and breakdown voltage in metalorganic vapor phase epitaxy AlGaN/GaN heterostructure field-effect transistors
    • W.S. Tan, P.A. Houston, P.J. Parbrook, D.A. Wood, G. Hill, C.R. Whitehouse, Gate Leakage effects and breakdown voltage in metalorganic vapor phase epitaxy AlGaN/GaN heterostructure field-effect transistors, Appl Phys Lett 2002, vol. 80, No. 17, pp. 3207-09.
    • (2002) Appl Phys Lett , vol.80 , Issue.17 , pp. 3207-3209
    • Tan, W.S.1    Houston, P.A.2    Parbrook, P.J.3    Wood, D.A.4    Hill, G.5    Whitehouse, C.R.6
  • 7
    • 0035935955 scopus 로고    scopus 로고
    • Recessed 0.25 μm gate AlGaN/GaN HEMTs on SiC with high gate-drain breakdown voltage using ICP-RIE
    • V. Kumar, W. Lu, F.A. Khan, R. Schwindt, E. Piner, I. Adesida, "Recessed 0.25 μm gate AlGaN/GaN HEMTs on SiC with high gate-drain breakdown voltage using ICP-RIE", Electronics Lett 2001, vol. 37, No. 24, pp. 1483-85.
    • (2001) Electronics Lett , vol.37 , Issue.24 , pp. 1483-1485
    • Kumar, V.1    Lu, W.2    Khan, F.A.3    Schwindt, R.4    Piner, E.5    Adesida, I.6
  • 8
    • 3943098679 scopus 로고    scopus 로고
    • Characterization of reactive ion etching-induced damage to n-GaN surface using Schottky diodes
    • A.T. Ping, A.C. Schmitz, I. Adesida, A. M. Khan, Q. Chen, J. Yang, "Characterization of reactive ion etching-induced damage to n-GaN surface using Schottky diodes", J. Electron Matter 1997, vol. 26, No. 3, pp. 266-271.
    • (1997) J. Electron Matter , vol.26 , Issue.3 , pp. 266-271
    • Ping, A.T.1    Schmitz, A.C.2    Adesida, I.3    Khan, A.M.4    Chen, Q.5    Yang, J.6
  • 9
    • 0003099389 scopus 로고
    • New York: Wiley
    • nd Ed. New York: Wiley, 1981. p. 403.
    • (1981) nd Ed. , pp. 403
    • Sze, S.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.