Hybrid evaporation: Glow discharge source for plasma immersion ion implantation

Review of Scientific Instruments

Volumn 74, Issue 10, 2003, Pages 4301-4304

  Li, L H ^a,b   Poon, R W Y ^a   Kwok, S C H ^a   Chu, P K ^a   Wu, Y Q ^b   Zhang, Y H ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b BEIHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EVAPORATION; GLOW DISCHARGES; ION IMPLANTATION; MELTING; VAPOR PRESSURE;

PLASMA IMMERSION ION IMPLANTATION;

PLASMAS;

EID: 0142229425     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1606535     Document Type: Article

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