SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Surface and Coatings Technology

Volumn 161, Issue 2-3, 2002, Pages 232-236

Influence of bias voltage on the tribological properties of titanium nitride films fabricated by dynamic plasma ion implantation/deposition

(4) Tian, X B a Zhang, T a Fu, R K Y a Chu, P K a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

Ion implantation; Plasma processing and deposition; Tribology

Indexed keywords

ADHESION; DEPOSITION; FABRICATION; ION IMPLANTATION; NITROGEN; PLASMAS; STAINLESS STEEL; SUBSTRATES; TRIBOLOGY;

PULSED VACCUM ARCS;

TITANIUM NITRIDE;

COATING; FILM THICKNESS; TITANIUM NITRIDE; TRIBOLOGY;

EID: 0037010652 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00416-4 Document Type: Article

Times cited : (9)

References (29)

1
- 0030131453
- (1996) Surf. Coat. Technol , vol.81 , pp. 118
- Cotell, C.M.¹ Hirvonen, J.K.²

2
- 0001085539
- (1993) Nucl. Instrum. Meth. B , vol.80-81 , pp. 445
- Ensinger, W.¹ Schroer, A.² Wolf, G.K.³

3
- 0034532523
- (2000) Surf. Coat. Technol , vol.131 , pp. 267
- Czerwiec, T.¹ Renevier, N.² Michel, H.³

4
- 0042633781
- (1987) J. Appl. Phys , vol.62 , pp. 4591
- Conrad, J.R.¹ Radke, J.I.² Dodd, R.A.³ Warzala, F.J.⁴ Tran, N.C.⁵

5
- 0004215110
- John Wiley and Sons, Inc, New York
- (2000) Handbook of Plasma Immersion Ion Implantation and Deposition
- Anders, A.¹

6
- 0036162801
- (2002) J. Vac. Sci. Technol , vol.20 A , pp. 160
- Tian, X.B.¹ Fu, R.K.Y.² Chu, P.K.³

7
- 0004327498
- in press
- Mater. Sci. Eng. A
- Tian, X.B.¹ Wang, L.P.² Fu, R.K.Y.³ Chu, P.K.⁴

8
- 0035334393
- (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 1008
- Tian, X.B.¹ Chu, P.K.²

9
- 2142778955
- (1989) J. Appl. Phys , vol.66 , pp. 2926
- Lieberman, M.A.¹

10
- 0001135707
- (2000) Appl. Phys. Lett , vol.76 , pp. 28
- Anders, A.¹

11
- 36449000220
- (1994) Rev. Sci. Instrum , vol.65 , pp. 3061
- Brown, I.G.¹

12
- 0001621931
- (2000) J. Appl. Phys , vol.88 , pp. 5618
- Yushkov, G.Y.¹ Anders, A.² Oks, E.M.³ Brown, I.G.⁴

13
- 0003412161
- Pergamon, New York
- (1985) The Stopping Power and Range of Ions in Solids
- Ziegler, J.F.¹ Biersack, J.P.² Littmark, U.³

14
- 0001474274
- (2000) Appl. Phys. Lett , vol.76 , pp. 1531
- Schneider, J.M.¹ Anders, A.² Hjörvarsson, B.³ Hultman, L.⁴

15
- 0036642109
- (2002) Surf. Coat. Technol , vol.156 , pp. 244
- Chu, P.K.¹

16
- 0030270745
- (1996) Surf. Coat. Technol , vol.84 , pp. 439
- Koniger, A.¹ Gerlach, J.W.² Wengenmair, H.³ Hammerl, C.⁴ Hartmann, J.⁵ Rauschenbach, B.⁶

17
- 0020938924
- (1983) Wear , vol.92 , pp. 143
- Hutchings, R.¹ Oliver, W.C.²

18
- 0021543684
- (1984) Metal. Trans. A , vol.15 , pp. 2221
- Oliver, W.C.¹ Hutchings, R.² Pethica, J.B.³

19
- 0024883925
- (1989) Thin Solid Films , vol.181 , pp. 505
- Koerber, F.J.¹ Petersein, H.² Ranke, H.³

20
- 0024902511
- (1989) Thin Solid Films , vol.181 , pp. 333
- Raud, S.¹ Delage, J.² Villain, J.P.³ Moine, P.⁴

21
- 0033513757
- (1999) Nucl. Instrum. Meth. B , vol.148 , pp. 917
- Vera, E.¹ Wolf, G.K.²

22
- 0032184143
- (1998) Surf. Coat. Technol , vol.109 , pp. 284
- Sikola, T.¹ Spousta, J.²

23
- 0030270745
- (1996) Surf. Coat. Technol , vol.84 , pp. 439
- Koniger, A.¹ Gerlach, J.W.² Wengenmair, H.³ Hammerl, C.⁴ Hartmann, J.⁵ Rauschenbach, B.⁶

24
- 17444440583
- (2001) Surf. Coat. Technol , vol.146 , pp. 243
- Klingenberg, M.L.¹ Demaree, J.D.²

25
- 0343851560
- (1999) Surf. Coat. Technol , vol.119 , pp. 969
- Hubler, R.¹ Tentardini, E.K.² Blando, E.³

26
- 0033723502
- (2000) Surf. Coat. Technol , vol.128 , Issue.129 , pp. 245
- Sano, M.¹ Teramoto, T.² Yukimura, K.³ Maruyama, T.⁴

27
- 0035386102
- (2001) Surf. Coat. Technol , vol.142 , pp. 978
- Guenzel, R.¹ Shevshenko, N.² Matz, W.³ Mucklich, A.⁴ Celis, J.P.⁵

28
- 0032523661
- (1998) Wear , vol.217 , pp. 159
- Fu, Y.Q.¹ Zhu, X.D.² Tang, B.³

29
- 4243906113
- (1993) Nucl. Instrum. Meth. B , vol.80-81 , pp. 1367
- Sugiyama, K.¹ Hayashi, H.² Sasaki, J.³ Ichiko, O.⁴ Hashiguchi, Y.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.