Barrier studies on porous silk semiconductor dielectric

Microelectronic Engineering

Volumn 70, Issue 2-4, 2003, Pages 352-357

  Tokei, Zs ^a   Iacopi, F ^a   Richard, O ^a   Waeterloos, J ^b   Rozeveld, S ^b   Beach, E ^b   Mebarki, B ^a   Mandrekar, T ^c   Guggilla, S ^c   Maex, K ^a  

^a IMEC   (Belgium)

^b DOW CHEMICAL COMPANY   (United States)

^c APPLIED MATERIALS INC   (United States)

Author keywords

Barrier deposition; EnCoRe; I PVD; Porous SiLK semiconductor dielectric

Indexed keywords

NUCLEATION; PHYSICAL VAPOR DEPOSITION; SEMICONDUCTOR MATERIALS; SILK;

BARRIER DEPOSITION;

DIELECTRIC MATERIALS;

EID: 0142075270     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00368-X     Document Type: Conference Paper

References (9)

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