Epitaxial C49-TiSi2 phase formation on the silicon (100)

Journal of Applied Physics

Volumn 94, Issue 6, 2003, Pages 4198-4202

  Yang, Jun Mo ^a   Park, Ju Chul ^a   Park, Dae Gyu ^a,c   Lim, Kwan Yong ^a   Lee, Soun Young ^a   Park, Sung Wook ^a   Kim, Youn Joong ^b  

^a Hynix Semiconductor Inc   (South Korea)

^b Korea Basic Science Institute (KBSI)   (South Korea)

^c IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; TRANSMISSION ELECTRON MICROSCOPY;

PHASE FORMATIONS;

SILICON;

EID: 0141955802     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1604955     Document Type: Article

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