Degradation and Breakdown of Plasma Oxidized Magnetic Tunnel Junctions: Single Trap Creation in AL2O3 Tunnel Barriers

IEEE Transactions on Magnetics

Volumn 39, Issue 5 II, 2003, Pages 2815-2817

  Das, Jo ^a,b   Degraeve, Robin ^a   Kaczer, Ben ^a   Boeve, Hans ^c   Vanhelmont, Frederik ^c   Groeseneken, Guido ^a,b   Borghs, Gustaaf ^a   De Boeck, Jo ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Dielectric breakdown; Magnetic tunnel junctions; Reliability

Indexed keywords

ALUMINUM COMPOUNDS; ELECTRIC BREAKDOWN; EXTRAPOLATION; PLASMA APPLICATIONS; RANDOM PROCESSES; STRESS ANALYSIS; TUNNEL JUNCTIONS;

MAGNETIC TUNNEL JUNCTIONS;

MAGNETIC SEMICONDUCTORS;

EID: 0141953092     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2003.815721     Document Type: Article

References (9)

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