Electrical breakdown of the magnetic tunneling junction with an AlOx barrier formed by radical oxidation

Journal of Applied Physics

Volumn 87, Issue 9 II, 2000, Pages 5194-5196

  Shimazawa, K ^a   Kasahara, N ^a   Sun, J J ^a   Araki, S ^a   Morita, H ^a   Matsuzaki, M ^a  

^a TDK CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000294786     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373292     Document Type: Article

References (13)

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