Development of mask materials for EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1113-1120

  Heckle, Christine ^a   Hrdina, Kenneth ^a   Ackerman, Bradford ^a   Navan, David ^a  

^a Corning Incorporated ^*  (United States)

Author keywords

EUV; Low expansion; Photoblank; ULE Glass

Indexed keywords

GLASS; LIGHT REFLECTION; LITHOGRAPHY; OPTICAL TELESCOPES;

PHOTOMASKS;

MASKS;

EID: 0038641994     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467778     Document Type: Conference Paper

References (6)

1. 2 System" International Conference on Physics of Non-Crystalline Solids, pg 453-461, Wiley-Interscience, 1970.
2. D.S. Carson, R.D. Maurer, "Optical Attenuation in Titania-Silica Glasses" JNCS (11) pg 368-380,1973.
3. N. Bareket, S. Biellak, D. Pettibone, S. Stokowski, "Next generation lithography mask inspection" SPIE Vol 4066, pg 514, 2000.
4. K.E. Hrdina, B.Z. Hanson, P.M. Fenn, R. Sabia, "Characterization and characteristics of a ULE Glass tailored for EUVL needs" SPIE Vol 4688, pg 454, 2002.
5. H.E. Hagy, "High Precision Photoelastic and Ultrasonica Techniques for Determining Absolute and Differential Thermal Expansion of Titania-Silica Glasses" Appl Optics, 12[7] pg 1440, 1973.
6. H.E. Hagy, W.D. Shirkey, "Determining absolute thermal expansion of titania-silica glasses: a refined ultrasonic method" Appl Optics, 14[9] pg 2099, 1975.