Novel development method for CD control - Optimized spin-off develop method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 782-792

  Sakamoto, Kazuo ^a   Nishiya, Akira ^a   Yamamura, Kentarou ^a   Otsuka, Takahisa ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

CD; KrF resist; Loading effect; Multi puddle

Indexed keywords

MULTI-PUDDLE METHODS;

CORRELATION METHODS; COSTS; PHOTORESISTS; SCANNING;

PHOTOLITHOGRAPHY;

EID: 0036028892     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474279     Document Type: Conference Paper

References (2)

1. Kazuo Sakamoto, "Novel Develop Application Method to Improve Critical Dimension Control", SPIE Proceedings 4345,p569-579, 2001.
2. Shinichi Ito, Kei Hayasaki and Hiroko Nakamura, "Dissolution performance of device pattern with low-impact development", SPIE Proceedings 4345,p665-672, 2001.