The effect of mixing development method on CD uniformity

1999 International Microprocesses and Nanotechnology Conference

Volumn , Issue , 1999, Pages 156-157

  Nakamura, Hiroko ^a   Ema, Tatsuhiko ^a   Hayasaki, Kei ^a   Ito, Shinichi ^a   Okumura, Katsuya ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MIXING; NANOTECHNOLOGY;

CD UNIFORMITY; DEVELOPMENT METHOD; PATTERN SIZE; WAFER SIZES;

SEMICONDUCTOR DEVICES;

EID: 84994466398     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.1999.797524     Document Type: Conference Paper

References (0)