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Volumn 5037 I, Issue , 2003, Pages 286-293

Spectral reflectance tuning of EUV mirrors for metrology applications

Author keywords

Broadband mirror; Coating designs; EUV; Metrology; Mo Si; Narrowband mirror; Plasma source

Indexed keywords

BANDWIDTH; COATINGS; MOLYBDENUM; OPTICAL DESIGN; OPTICAL MULTILAYERS; OPTIMIZATION; PLASMA SOURCES; REFLECTION; SILICON; SPECTRUM ANALYSIS; THICKNESS MEASUREMENT; ULTRAVIOLET SPECTROSCOPY;

EID: 0141831812     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482644     Document Type: Conference Paper
Times cited : (12)

References (15)
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  • 7
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    • Wang, Z.1    Cao, J.2    Michette, A.G.3
  • 10
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    • X-ray multilayer mirrors with an extended angular range
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  • 11
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    • Broadband multilayer mirrors for optimum use of a soft x-ray source output
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  • 15
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.