Measurement of work function of transition metal nitride and carbide thin films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1607-1611

  Gotoh, Yasuhito ^a   Tsuji, Hiroshi ^a   Ishikawa, Junzo ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBIDES; ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; NITRIDES; TRANSITION METALS;

WORK FUNCTIONS;

THIN FILMS;

EID: 0141681177     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1591749     Document Type: Conference Paper

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