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Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

Mass spectroscopic and degassing characteristics of polymeric materials for 157 nm photolithography

(4) Cefalas, A C a Sarantopoulou, E a Argitis, P b Gogolides, E b

a THEORETICAL AND PHYSICAL CHEMISTRY INSTITUTE (Greece)

b INSTITUTE OF MICROELECTRONICS (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001126748 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390051561 Document Type: Article

Times cited : (14)

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