Nanopatterning of spin-coatable TiO2 resist using an electron beam

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 513-523

  Saifullah, M S M ^a   Welland, M E ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Chelating agents; Electron beam nanolithography; Inorganic resists; Metal alkoxides; Titania; Titanium dioxide

Indexed keywords

ACETONE; ELECTRON BEAMS; HEATING; PHOTOLITHOGRAPHY; PHOTORESISTS; SPIN COATING; SPUTTERING; THIN FILMS;

CHELATING AGENTS; INORGANIC RESISTS; METAL ALKOXIDES; NANOPATTERNING;

TITANIUM DIOXIDE;

EID: 0141611706     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485121     Document Type: Conference Paper

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