Preparation of photosensitive Al2O3 gel films and their application to fine-patterning

Kobunshi Ronbunshu

Volumn 53, Issue 4, 1996, Pages 253-259

  Zhao, Gaoyang ^a   Tohge, Noboru ^a  

^a KINKI UNIVERSITY   (Japan)

Author keywords

Al2O3; Chemical Modification; Fine Patterning; Photolysis; Sol Gel Process; Thin Film

Indexed keywords

ABSORPTION SPECTROSCOPY; ALUMINA; CHEMICAL MODIFICATION; ESTERS; IRRADIATION; KETONES; MERCURY VAPOR LAMPS; PHOTOLYSIS; PHOTOSENSITIVITY; SOL-GELS; SOLUBILITY; THIN FILMS;

FINE PATTERNING; GEL FILMS; SOL-GEL PROCESS;

GELS;

EID: 0030122979     PISSN: 03862186     EISSN: None     Source Type: Journal    
DOI: 10.1295/koron.53.253     Document Type: Article

References (16)

1. J. C. Debsikbar, J. Non-Cryst. Solids, 86, 231 (1986).
2. H. Uchihashi, N. Tohge, and T. Minami, Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi, 97, 396 (1989).
3. F. Babonneau, L. Coury, and J. Livage, J. Non-Cryst. Solids, 121, 153 (1990) .
4. Y. Abe, T. Gunji, Y. Kimata, M. Kuramata, A. Kasgoz, and T. Misono, J. Non-Cryst. Solids. 121, 21 (1990).
5. R. Nass and H. Schmidt, J. Non-Cryst. Solids, 121, 329 (1990).
6. N. Tohge, S. Takahashi, and T. Minami, J. Am. Ceram. Soc., 74, 67 (1991).
7. N. Tohge, E. Fujii, and T. Minami, J. Mater. Sci., Mater. Electron., 5, 356 (1994).
8. N. Tohge, K. Shinmou, and T. Minami, J. Sol-Gel Sci. Technol., 2, 581 (1994).
9. N. Tohge, K. Shinmou, and T. Minami, Jpn. J. Appl. Phys., 33, 1181 (1994).
10. N. Tohge, K. Shinmou, and T. Minami, SPIE Proc. Sol-Gel Optics III, 2288, 589 (1994).
11. P. R. Singh and R. Sahai, J. Lndian Chem. Soc., 46, 945 (1969).
12. L. Bonhomme-Coury, F. Babonneau, and J. Livage, J. Sol-Gel Sci. Technol., 3, 157 (1994).
13. Rama Jain, A. K. Rai, and R. C. Mehrototra, Polyhedron, 5, 1017 (1986).
14. E. J. Schimitschek and J. A. Trias, J. Inorg. Nucl. Chem., 32, 813 (1970).