Photosensitive gel films prepared by the chemical modification and their application to surface-relief gratings

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 85-90

  Tohge, N ^a   Zhao, G ^a   Chiba, F ^a  

^a KINKI UNIVERSITY   (Japan)

Author keywords

Coatings; Fine patterning; Optoelectronic devices; Photosensitivity

Indexed keywords

CHEMICAL MODIFICATION; DIFFRACTION GRATINGS; EXCIMER LASERS; GELS; HEAT TREATMENT; LEACHING; MORPHOLOGY; OPTOELECTRONIC DEVICES; OXIDES; PHOTOSENSITIVITY; SOLUBILITY; ULTRAVIOLET RADIATION;

CHELATE RINGS; FINE PATTERNING; PHOTOSENSITIVE GEL FILMS; SURFACE RELIEF GRATINGS;

OPTICAL COATINGS;

EID: 0033170201     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00082-6     Document Type: Article

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