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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4782, Issue , 2002, Pages 185-195

Microstructure of Mo/Si multilayers with barrier layers

(4) Braun, Stefan a Mai, Hermann a Moss, Matthew a Scholz, Roland b

a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS (Germany)

b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS (Germany)

Author keywords

B4C; Barrier; C; Diffusion; EUV; Mirror; Mo; Multilayer; Optics; Si; X ray

Indexed keywords

HIGH RESOLUTION ELECTRON MICROSCOPY; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; MICROSTRUCTURE; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIER LAYERS;

MULTILAYERS;

EID: 0037989858 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.453818 Document Type: Conference Paper

Times cited : (14)

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