Fabrication and characterization of HfC coated Si field emitter arrays

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1589-1593

  Sato, T ^a   Yamamoto, S ^a   Nagao, M ^b   Matsukawa, T ^b   Kanemaru, S ^b   Itoh, J ^b  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; ELECTRODES; ELECTROSTATIC LENSES; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SILICON; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FIELD EMITTER ARRAYS (FEA);

HAFNIUM COMPOUNDS;

EID: 0141569766     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1569933     Document Type: Conference Paper

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