Deposition of Diamond-Like carbon Films by High-Intensity Pulsed Ion Beam Ablation at Various Substrate Temperatures

Chinese Physics Letters

Volumn 20, Issue 9, 2003, Pages 1619-1621

  Mei, Xian Xiu ^a   Liu, Zhen Min ^a   Ma, Teng Cai ^a   Dong, Chuang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON FILMS; DEPOSITION; DIAMOND LIKE CARBON FILMS; FRICTION; ION BEAMS; SUBSTRATES; SURFACE ROUGHNESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC-FORCE-MICROSCOPY; DEPOSITION TECHNIQUE; DIAMOND LIKE CARBON; DIAMOND-LIKE CARBON FILM; FRICTION COEFFICIENTS; HIGH-INTENSITY PULSED ION BEAMS; SI SUBSTRATES; SUBSTRATES TEMPERATURE; VARIOUS SUBSTRATES; X-RAY PHOTOELECTRONS;

ABLATION;

EID: 0141567598     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/20/9/361     Document Type: Article

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