High intensity pulsed ion beam sources and their industrial applications

Surface and Coatings Technology

Volumn 114, Issue 2-3, 1999, Pages 206-212

  Remnev, G E ^a   Isakov, I F ^a   Opekounov, M S ^a   Matvienko, V M ^a   Ryzhkov, V A ^a   Struts, V K ^a   Grushin, I I ^a   Zakoutayev, A N ^a   Potyomkin, A V ^a   Tarbokov, V A ^a   Pushkaryov, A N ^a   Kutuzov, V L ^b   Ovsyannikov, M Yu ^b  

^a TOMSK POLYTECHNIC UNIVERSITY   (Russian Federation)

^b Linetron   (Russian Federation)

Author keywords

Deposition; High intensity pulsed ion beams; Ion implantation; Semiconductors; Surface modification; Thin films; Wear resistance

Indexed keywords

ION IMPLANTATION; SEMICONDUCTOR MATERIALS; SURFACE TREATMENT; THIN FILMS; WEAR RESISTANCE;

DIAMOND LIKE CARBON FILM; HIGH INTENSITY PULSED ION BEAM;

ION BEAMS;

EID: 0032672972     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00058-4     Document Type: Article

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