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Volumn 392, Issue 1-3, 1997, Pages 17-26

Nickel-induced defects and their role in governing chlorine chemistry on the Si(100) surface

(5) Dohnalek Z a Yang, W a Ukraintsev, V A a Choyke, W J a Yates Jr , J T a

a UNIVERSITY OF PITTSBURGH (United States)

Author keywords

Angle resolved DIET; Chemisorption; Chlorine; Etching; Nickel; Silicon; Surface defects; Thermal desorption spectroscopy

Indexed keywords

CHEMICAL BONDS; CHEMISORPTION; CHLORINE; CRYSTAL DEFECTS; CRYSTAL ORIENTATION; ETCHING; NICKEL; SEMICONDUCTING SILICON COMPOUNDS; SPECTROSCOPIC ANALYSIS; SURFACE STRUCTURE; TEMPERATURE PROGRAMMED DESORPTION;

ELECTRON STIMULATED DESORPTION ION ANGULAR DISTRIBUTION (ESDIAD); THERMAL DESORPTION SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0031366119 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(97)00098-8 Document Type: Article

Times cited : (6)

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