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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 4 SUPPL. B, 1997, Pages 2456-2459

Scanning tunneling microscopy observations and analysis of thermal etching of Si(100) with Br and Cl

(2) Aldao, Celso M a Weaver, John H b

a UNIVERSIDAD NACIONAL DE MAR DEL PLATA (Argentina)

b UNIVERSITY OF MINNESOTA (United States)

Author keywords

Etching; Halogens; Patterning; Si(100); STM; Surface reactions

Indexed keywords

THERMAL ETCHING;

BROMINE; CHLORINE; CRYSTAL ATOMIC STRUCTURE; ETCHING; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS; THERMAL EFFECTS;

SEMICONDUCTING SILICON;

EID: 0031120593 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.36.2456 Document Type: Review

Times cited : (5)

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