Negative photoresist for 157 nm microlithography; A progress report

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 94-100

  Conley, Will ^a   Trinque, Brian C ^b   Miller, Daniel ^a   Zimmerman, Paul ^a   Kudo, Takanori ^c   Dammel, Ralph ^c   Romano, Andrew ^c   Willson, C Grant ^b  

^a SEMATECH   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c CLARIANT CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; FLUORINE CONTAINING POLYMERS; MASKS; SPECTROSCOPIC ANALYSIS; SYNTHESIS (CHEMICAL); TRANSPARENCY;

NEGATIVE PHOTORESISTS;

PHOTORESISTS;

EID: 0036030224     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474187     Document Type: Article

References (4)

1. Kunz, R.R.B., T.M.; Hardy, D.E.; Goodman, R.B.; Downs, D.K.; Curtin, J.E. Proc. SPIE-Int. Soc. Opt. Eng. 1999, 3678, 13-20.
2. Bunsvold, W.R.; Conley, W.E.; Gelorme, J.D.; Wood, R.L.; Linehan, L.L.; Sooriyakumaran, R.; Tai, T.-I. In Eur. Pat. Appl.; (International Business Machines Corp., USA). EP, 1994; p 10 pp.
3. Sachdev, H.; Kwong, R.; Linehan, L.; Conley, W.; Miura, S.; Smith, R.; Katnani, A. In Microelectron. Eng., 1994; Vol. 23, pp 321-326.
4. Hung, R.J.-P.; Tran, H.V.; Trinque, B.C.; Chiba, T.; Yamada, S.; Sanders, D.; Connor, E.F.; Grubbs, R.H.; Klopp, J.M.; Frechet, J.M.J.; Thomas, B.H.; Sharer, G.J.; DesMarteau, D.D.; Conley, W.; Grant, W.C. Proc. SPIE-Int. Soc. Opt. Eng. 2001, 4345, 385-395.