Yttrium oxide thin films, Y2O3, grown by ion beam sputtering on Si

Journal of Physics D: Applied Physics

Volumn 33, Issue 22, 2000, Pages 2884-2889

  Gaboriaud, R J ^a   Pailloux, F ^a   Guerin, P ^a   Paumier, F ^a  

^a UNIVERSITÉ DE POITIERS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELLIPSOMETRY; ION BEAMS; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; YTTRIUM COMPOUNDS;

ION BEAM SPUTTERING; YTTRIUM SESQUIOXIDE;

SEMICONDUCTING FILMS;

EID: 0034322129     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/33/22/304     Document Type: Article

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