Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction

Applied Surface Science

Volumn 218, Issue 1-4, 2003, Pages 251-258

  Li, X ^a   Goodhue, W D ^a   Santeufeimio, C ^b   Tetreault, T G ^b   MacCrimmon, R ^b   Allen, L P ^b   Bliss, D ^c   Krishnaswami, K ^a   Sung, C ^a  

^a UNIVERSITY OF MASSACHUSETTS LOWELL   (United States)

^b Epion Corporation   (United States)

^c NONE

Author keywords

GaSb substrates; GCIB; Photovoltaic cell

Indexed keywords

CHEMICAL POLISHING; ION BEAMS; MOLECULAR BEAM EPITAXY; PHOTOVOLTAIC CELLS; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

GAS CLUSTERS; INFRARED WAVELENGTHS;

GALLIUM COMPOUNDS;

EID: 0042694714     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00681-0     Document Type: Article

References (7)

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