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Journal of Electronic Materials

Volumn 30, Issue 7, 2001, Pages 829-833

Substrate smoothing using gas cluster ion beam processing

(8) Allen, L P a Fenner, D B a DiFilippo, V a Santeufemio, C a Degenkolb, E a Brooks, W a Mack, M a Hautala, J a

a Epion Corporation (United States)

Author keywords

Gas cluster ion beam; Surface modification; Surface smoothing

Indexed keywords

COMPOSITION; ELECTRIC SPACE CHARGE; ION BEAMS; SURFACE ROUGHNESS; SURFACE TREATMENT;

GAS CLUSTER ION BEAMS; SILICON ON INSULATOR MATERIAL; SPACE CHARGE EFFECT; SURFACE ABERRATIONS; SURFACE SMOOTHING;

SEMICONDUCTING SILICON;

EID: 0035391398 PISSN: 03615235 EISSN: None Source Type: Journal
DOI: 10.1007/s11664-001-0066-3 Document Type: Article

Times cited : (19)

References (9)

1
- 0003343521
- (Tokyo: The Ion Eng. Soc. of Japan)
- (1991) Proc. of the 14th Symp. on Ion Sources and Ion Assisted Technology , pp. 227-235
- Yamada, I.¹

2
- 0004440728
- (Sept.)
- (2000) J. Vac. Sci. and Technol.
- Fener, D.B.¹ Hautala, J.² Allen, L.P.³ Greer, J.A.⁴ Tetrault, T.G.⁵ Al-Jibouri, A.⁶ Budnick, J.I.⁷ Jones, K.S.⁸

3
- 37049012315
- (2000) Surf. and Coatings Technol.
- Greer, J.A.¹ Fenner, D.B.² Hautala, J.³ Allen, L.P.⁴ DiFilippo, V.⁵ Toyoda, N.⁶ Yamada, I.⁷ Matsuo, J.⁸ Minami, E.⁹ Katsumata, H.¹⁰

4
- 0033892605
- (2000) Nucl. Instrum. and Methods in Phys. Res. B , vol.161-163 , pp. 980
- Toyoda, N.¹ Hagiwara, N.² Matsuo, J.³ Yamada, I.⁴

5
- 0004386290
- (Warrendale, PA: MRS)
- (2000) Simulations and Ar Cluster Ion Smoothing of Surfaces
- Fenner, D.B.¹ Dean, D.W.² Allen, L.P.³ Hautala, J.⁴ Mirkarimi, P.B.⁵

6
- 5844321304
- (1996) J. Vac. Sci. and Technol. A , vol.14 , pp. 781
- Yamada, I.¹ Matsuo, J.² Insepov, Z.³ Takeuchi, D.⁴ Akizuki, M.⁵ Toyoda, N.⁶

7
- 0033314056
- Proc. of the 1999 IEEE Int. SOI Conf. (Piscataway, NJ: IEEE, 1999) , pp. 116
- Allen, L.P.¹ Fenner, D.B.² Skinner, W.J.³ Chandonnet, R.⁴ Deziel, S.E.⁵ Torti, R.P.⁶ Toyoda, N.⁷

8
- 0030406507
- (1996) MRS Symp. Proc. , vol.427 , pp. 265
- Yamada, I.¹ Matsuo, J.²

9
- 0004439056
- (in print)
- Proc. of THERMEC '2000: Int. Conf. on Processing and Manuf. of Adv. Mater.
- DiFilippo, V.¹ Saigal, A.² Fenner, D.B.³ Allen, L.P.⁴ Hirvonen, J.K.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.