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Volumn 42, Issue 6 B, 2003, Pages 3900-3904

Vacuum ultraviolet (VUV)-light-induced outgassing from resist polymers: A study using in situ quartz crystal microbalance (QCM) technique

Author keywords

FT IR speotroscopy; In situ QCM technique; Outgassing; Photodegradation; Photoresist; Vacuum ultraviolet light

Indexed keywords

CRYSTALS; FLUORINE CONTAINING POLYMERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IRRADIATION; PHOTODEGRADATION; QUARTZ;

QUARTZ CRYSTAL MICROBALANCE (QCM) TECHNIQUE;

DEGASSING;

EID: 0042362297 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.3900 Document Type: Conference Paper

Times cited : (4)

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