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Volumn 42, Issue 6 B, 2003, Pages 4016-4019

Synchrotron radiation stimulated etching of SiO2 thin films with a Co contact mask for the area-selective deposition of self-assembled monolayer

Author keywords

Area selective deposition; Etched pattern; Self assembled monolayer; SiO2 thin film; Synchrotron radiation stimulated etching

Indexed keywords

ATOMIC FORCE MICROSCOPY; COBALT; ELLIPSOMETRY; ETCHING; INFRARED SPECTROSCOPY; SELF ASSEMBLY; SYNCHROTRON RADIATION; THIN FILMS;

AREA-SELECTIVE DEPOSITION;

SILICA;

EID: 0042362200 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.4016 Document Type: Conference Paper

Times cited : (11)

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