Si-wafer bending technique for a three-dimensional microoptical bench

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 4063-4066

  Ishimori, Masahiro ^a   Song, JongHyeong ^a   Sasaki, Minoru ^a   Hane, Kazuhiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Jig; MEMS; Photoresist joint; Three dimensional microstruoture; Wafer bending

Indexed keywords

MICROMACHINING; MICROSTRUCTURE; PHOTOLITHOGRAPHY; PHOTORESISTS; SILICON WAFERS;

PHOTORESIST JOINTS;

MICROOPTICS;

EID: 0042362169     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4063     Document Type: Conference Paper

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