Sidewall surface roughness of sputtered silicon II: Model verification

Surface Engineering

Volumn 19, Issue 2, 2003, Pages 104-108

  Ali, M Y ^a   Hung, N P ^b   Ngoi, B K A ^a   Yuan, S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UTC Aerospace Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION BEAMS; MOLECULAR ORIENTATION; ROUGHNESS MEASUREMENT; SILICON WAFERS; SINGLE CRYSTALS; SPUTTERING;

FOCUSED ION BEAMS (FIB);

SURFACE ROUGHNESS;

EID: 0042308411     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708403225002522     Document Type: Article

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