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Volumn 16, Issue 3, 2001, Pages 315-329
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Surface roughness of sputtered silicon. II. Model verification
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Author keywords
Beam profile; Dry etching; Dwell time; Focused ion beam; Intensity profile; Microfabrication; Micromachining; Micromilling; Micromolding; Microtools; Mod eling; Silicon; Sputtering; Surface finish; Surface roughness
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DRY ETCHING;
ION BEAMS;
MATHEMATICAL MODELS;
MICROMACHINING;
ROUGHNESS MEASUREMENT;
SPUTTERING;
SURFACE ROUGHNESS;
SURFACE TOPOGRAPHY;
FOCUSED ION BEAM;
MATERIAL FUNCTION;
MICROMOLDING;
MICROTOOLS;
SURFACE FINISH;
SILICON WAFERS;
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EID: 0035342879
PISSN: 10426914
EISSN: None
Source Type: Journal
DOI: 10.1081/AMP-100107377 Document Type: Article |
Times cited : (13)
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References (11)
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