Surface roughness of sputtered silicon. I. Surface modeling

Materials and Manufacturing Processes

Volumn 16, Issue 3, 2001, Pages 297-313

  Ali, M Y ^a   Hung, N P ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Beam profile; Dry etching; Dwell time; Focused ion beam; Intensity profile; Microfabrication; Micromachining; Micromiling; Micromolding; Microtools; Mode ling; Silicon; Sputtering; Surface finish; Surface roughness

Indexed keywords

DRY ETCHING; ION BEAMS; MATHEMATICAL MODELS; MICROMACHINING; NUMERICAL ANALYSIS; SPUTTERING; SURFACE ROUGHNESS;

CUMULATIVE INTENSITY; ION ACCELERATION ENERGY; ION BEAM INTENSITY DISTRIBUTION; ION BEAM SPUTTERING; MATERIAL FUNCTION; SURFACE MODELING;

SILICON;

EID: 0035342890     PISSN: 10426914     EISSN: None     Source Type: Journal    
DOI: 10.1081/AMP-100107376     Document Type: Article

References (22)

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