Evaluation of oxalyl fluoride for a dielectric etch application in an inductively coupled plasma etch tool

Journal of the Electrochemical Society

Volumn 148, Issue 3, 2001, Pages

  Karecki, Simon ^a   Chatterjee, Ritwik ^a   Pruette, Laura ^a   Reif, Rafael ^a   Sparks, Terry ^a   Beu, Laurie ^a   Vartanian, Victor ^a   Novoselov, Konstantin ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012226918     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1348263     Document Type: Article

References (4)

1. S. Karecki, L. Pruette, R. Reif, T. Sparks, L. Beu, and V. Vartanian, J. Electrochem. Soc., 145, 4305 (1998).
2. S. Samukawa and T. Mukai, J. Vac. Sci. Technol. A, 17, 2551 (1999).
3. S. Samukawa and K. Tsuda, Jpn. J. Appl. Phys., Part 2, 37, L1095 (1998).
4. L. A. Curtiss, K. Raghavachari, G. W. Trucks, and J. A. Pople, J. Chem. Phys., 94, 7221 (1991).