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Volumn 83, Issue 8, 2003, Pages 1545-1547

Strain relaxation in graded InGaN/GaN epilayers grown on sapphire

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; GALLIUM NITRIDE; SAPPHIRE; STRAIN;

EID: 0042281654     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1598295     Document Type: Article
Times cited : (39)

References (13)
  • 7
    • 20244372704 scopus 로고    scopus 로고
    • note
    • -1 as the frequency of the unstrained GaN (400-μm-thick freestanding GaN) and similar values of the Gruneisen parameters from Ref. 5. The results show that stress in the epilayers in structure I with graded InGaN/GaN buffers <0.03 GPa.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.