Dielectric properties and tunability of Mg-doped Ba0.96Ca 0.04Ti0.84Zr0.16O3 thin films on Pt/MgO fabricated by metal organic decomposition method

Materials Letters

Volumn 57, Issue 26-27, 2003, Pages 4147-4150

  Kalkur, T S ^a   Yi, Woo Chul ^a   Philofsky, Elliott ^b   Kammerdiner, Lee ^b  

^a University of Colorado Colorado Springs   (United States)

^b Applied Ceramics Research   (United States)

Author keywords

Ba0.96Ca0.04Ti0.84Zr0.16O 3 (BCTZ); Dielectric constant; Dissipation factor; Tunability

Indexed keywords

ELECTRIC LOSSES; ELECTRODES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

TUNABILITY;

BARIUM COMPOUNDS;

EID: 0042229118     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(03)00280-5     Document Type: Article

References (20)

1. Kingon A.I., Streifer S.K., Basceri C., Sommerfelt S.R. Mater. Res. Bull. 21:1995;18.
2. Caroll K.R., Pond J.M., Christey D.B., Horwitz J.S., Leuchner R.E. Appl. Phys. Lett. 62:1993;1845.
3. Joshi P.C., Cole M.W. Appl. Phys. Lett. 77:2000;289.
4. Chen C.L., Feng H.H., Zhang Z., Brazdeikis A., Huang Z.J., Chu W.K., Chu C.W., Miranda F.A., Van Keuls F.W., Romanofsky R.R. Appl. Phys. Lett. 75:1999;412.
5. Im J., Auciello O., Baumannn P.K., Striffer S.K. Appl. Phys. Lett. 76:2000;625.
6. Hoffman S., Waser R.M. Integr. Ferroelectr. 17:1997;141.
7. Hansen P., Henning D., Schreinemacher H. J. Am. Cearm. Soc. 81:1998;1369.
8. Yi W.-C., Kalkur T.S., Philofsky E., Kammerdiner L. Appl. Phys. Lett. 78:2001;3517.
9. Shannon R.D. Acta Crystallgr., A Cryst. Phys., Diffr. Theor. Gen. Crystallogr. 32:1976;751.
10. Powder Diffarction File (International Center for Diffraction Data, Swathmore, PA, 1995) JCPDS card 36-19.
11. Thomas R., Dube D.C., Kamalasanan M.N., Chandra S. Thin Solid Films. 346:1999;212.
12. Padmini P., Taylor T.R., Lefevre M.J., Nagra A.S., York R.A., Speck J.S. Appl. Phys. Lett. 75:1999;3186.
13. Ang C., Yu Z., Cross L.E. Appl. Phys. Lett. 62:2000;228.
14. Schlinder G., Hartner W., Joshi V., Solayappn N., Derbenwick G., Nazure C. Integr. Ferroelectr. 17:1997;421.
15. Narayan J., Tiwari P., Jagannadham K., Holland O.W. Appl. Phys. Lett. 64:1994;2093.
16. Shimakawa Y., Kubo Y. Appl. Phys. Lett. 77:2000;2590.
17. Wu T.B., Wu C.M., Chen M.L. Thin Solid Films. 334:1998;77.
18. Shy H.J., Wu T.B. Jpn. J. Appl. Phys. Part 1. 37:1998;4049.
19. Wu D., Li A., Ling H., Yin X., Ge C., Wang M., Ming N. Appl. Surf. Sci. 165:2000;309.
20. Im J., Streiffer S.K., Aucello O., Krauss A.R. Appl. Phys. Lett. 77:2000;2593.