Enhancement of extreme ultraviolet reflective multilayer properties by the insertion of Ru barrier layer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3792-3795

  Lee, Seung Yoon ^a   Kim, Tae Geun ^a   Ahn, Jinho ^a  

^a Hanyang University   (South Korea)

Author keywords

Barrier layer; EUVL; Mo SI; Multilayer; Reflectivity; Ru

Indexed keywords

INTERFACES (MATERIALS); MAGNETRON SPUTTERING; MICROSTRUCTURE; RUTHENIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

STACKING QUALITY;

MULTILAYERS;

EID: 0041862552     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3792     Document Type: Conference Paper

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