Nanometer pattern-mask fabricated by conventional photolithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7786-7790

  Fujimaru, Kouji ^a   Ono, Takashi ^a   Nagai, Ryuta ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

A metal insulator tunnel transistor (MITT); Anodic oxidation; Etching selectivity; Integrated circuit (IC); Metal insulator metal (MIM) structure

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; ETCHING; FILM GROWTH; MASKS; MIM DEVICES; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM DIOXIDE; TRANSISTORS;

METAL/INSULATOR TUNNEL TRANSISTORS (MITT); NANOMETER PATTERN MASKS;

PHOTOLITHOGRAPHY;

EID: 0031340939     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7786     Document Type: Article

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