Influence of deposition parameters on the dielectric properties of rf magnetron sputtered Ba(ZrxTi1-x)O3 thin films

Journal of the European Ceramic Society

Volumn 23, Issue 13, 2003, Pages 2307-2314

  Wang, Moo Chin ^a   Chen, Chung Yi ^b   Hsi, Chi Shiung ^c   Wu, Nan Chung ^b  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^c I SHOU UNIVERSITY   (Taiwan)

Author keywords

Ba(Zr,Ti)O3; Dielectric properties; Sputtering; Thin films

Indexed keywords

DEPOSITION; MAGNETRON SPUTTERING; PERMITTIVITY; THIN FILMS;

RADIO FREQUENCIES;

BARIUM COMPOUNDS;

FILM;

EID: 0041340589     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(03)00039-6     Document Type: Article

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