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Volumn 80, Issue A, 1999, Pages 73-75

Surface analysis by highly charged ion based secondary ion mass Spectrometry

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0040212939     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article
Times cited : (17)

References (15)
  • 1
    • 0040308567 scopus 로고    scopus 로고
    • The National Technology Roadmap for Semiconductors (Semiconductor Industries Association, San Jose, Ca, 1994)
    • The National Technology Roadmap for Semiconductors (Semiconductor Industries Association, San Jose, Ca, 1994).
  • 7
    • 0007080286 scopus 로고    scopus 로고
    • Schenkel, T. et al., Nucl. Instrum. Meth. Phys. Res. B 125, 153 (1997); Schenkel, T. et al., J. Vac. Sci. Technol. A 16, 1384 (1998).
    • (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 1384
    • Schenkel, T.1
  • 14
    • 0040902681 scopus 로고    scopus 로고
    • to be published
    • Barnes, A. V. et al., to be published.
    • Barnes, A.V.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.