Potential sputtering of clean SiO2 by slow highly charged ions

Physical Review Letters

Volumn 79, Issue 5, 1997, Pages 945-948

  Sporn, M ^a   Libiseller, G ^a   Neidhart, T ^a   Schmid, M ^a   Aumayr, F ^a   Winter, H P ^a   Varga, P ^a   Grether, M ^b   Niemann, D ^b   Stolterfoht, N ^b  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4243219619     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.79.945     Document Type: Article

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