Quantification of metal trace contaminants on Si wafer surfaces by Laser-SNMS and TOF-SIMS using sputter deposited submonolayer standards

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 4, 1996, Pages 2712-2724

  Schnieders, A ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013316928     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589009     Document Type: Article

References (17)

1. H.-G. Cramer, U. Jürgens, E. Niehuis, M. Terhorst, Zhiyuan Zhang, and A. Benninghoven, in Proceedings of the 9th International Conference on Secondary Ion Mass Spectrometry, SIMS IX, Yokohama 1993, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley, Chichester, 1994), p. 449.
2. J. Knoth, H. Schwenke, and U. Weisbrod, Spectrochim. Acta Part B 44, 477 (1989).
3. E. Niehuis, T. Heller, U. Jürgens, and A. Benninghoven, J. Vac. Sci. Technol. B 7, 512 (1989).
4. U. Jürgens, H.-G. Cramer, T. Heller, E. Niehuis, Zhiyuan Zhang, and A. Benninghoven, in Proceedings of the 8th International Conference on Secondary Ion Mass Spectrometry, SIMS VIII, Amsterdam 1991, edited by A. Benninghoven, K. T. F. Janssen, J. Tümpner, and H. W. Werner (Wiley, Chichester, 1992), p. 277.
5. M. Terhorst, R. Möllers, A. Schnieders, E. Niehuis, and A. Benninghoven, in Proceedings of the 9th International Conference on Secondary Ion Mass Spectrometry, SIMS IX, Yokohama 1993, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley, Chichester, 1994), p. 434.
6. A. Schnieders, F. Schröder-Oeynhausen, B. Burkhardt, F. Kötier, R. Möllers, L. Wiedmann, and A. Benninghoven, in Proceedings of the 10th International Conference on Secondary Ion Mass Spectrometry, SIMS VIII, Münster 1995, edited by A. Benninghoven, B. Hagenhoff, and H. W. Werner (Wiley, Chichester, in press).
7. C. H. Becker and K. T. Gillen, Anal. Chem. 56, 1671 (1984).
8. G. Kampwerth, M. Terhorst, E. Niehuis, and A. Benninghoven, in Proceedings of the 8th International Conference on Secondary Ion Mass Spectrometry, SIMS VIII, Amsterdam 1991, edited by A. Benninghoven, K. T. F. Janssen, J. Tümpner, and H. W. Werner (Wiley, Chichester, 1992), p. 563.
9. M. Wahl, D. Koch, W. Berthold, and A. Wucher (unpublished).
10. S. Hayashi, in Proceedings of the 9th International Conference on Secondary Ion Mass Spectrometry, SIMS IX, Yokohama 1993, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley, Chichester, 1994), p. 339.
11. J. Schwieters, H.-G. Cramer, T. Heller, U. Jürgens, E. Niehuis, J. Zehnpfenning, and A. Benninghoven, J. Vac. Sci. Technol. A 9, 2864 (1991).
12. R. Stein, Int. J. Mass Spectrom. Ion Phys. 14, 205 (1974).
13. N. Matsunami, Y. Yamamura, Y. Itikawa, N. Itoh, Y. Kazumata, S. Miyagawa, K. Monta, R. Shimizu, and H. Tawara, Atom. Data Nucl. Data Tables 31, 1 (1984).
14. P. Sigmund, Phys. Rev. 184, 383 (1969).
15. J.-F. Hennequin, J. Phys. (Paris) 29, 957 (1968).
16. P. Lambropoulos and X. Tang, J. Opt. Soc. Am. B 4, 821 (1987).
17. S. Hayashi, Y. Hashiguchi, K. Suzuki, T. Ohtsubo, and B. J. McIntosh, Surf. Interface Anal. 17, 773 (1991).