Modelling of anisotropic etching of silicon: Anomalies due to facet boundary effects

Sensors and Materials

Volumn 15, Issue 2, 2003, Pages 67-81

  Elalamy, Ziyad ^a   Landsberger, Leslie M ^a   Kahrizi, Mojtaba ^a   Pandy, Anand ^a   Stateikina, Irina ^a   Michel, Sébastien ^a,b  

^a Dept of Electrical and Computer Engineering   (Canada)

^b DALSA Semiconductor Inc   (Canada)

Author keywords

Anisotropic etching of silicon; Crystal based modelling anomalies

Indexed keywords

EID: 0038692080     PISSN: 09144935     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (19)

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