Simulation of anisotropic wet-chemical etching using a physical model

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1999, Pages 332-337

  van Suchtelen, J ^a   Sato, K ^a   van Veenendaal, E ^a   Nijdam, A J ^a   Gardeniers, J G E ^a   van Enckevort, W J P ^a   Elwenspoek, M ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL GROWTH; CRYSTAL ORIENTATION; ETCHING; POTASSIUM COMPOUNDS; SEMICONDUCTING SILICON; SINGLE CRYSTALS;

WET CHEMICAL ETCHING;

MICROELECTRONIC PROCESSING;

EID: 0032688942     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/memsys.1999.746850     Document Type: Conference Paper

References (23)