Anomalies in modeling of anisotropic etching of silicon: Facet boundary effects

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 1927-1933

  Elalamy, Ziyad ^a   Landsberger, Leslie M ^a   Pandy, A ^a   Kahrizi, M ^a   Stateikina, I ^a   Michel, S ^a  

^a Dept of Electrical and Computer Engineering   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; CRYSTAL STRUCTURE; ETCHING;

ANISOTROPIC ETCHING;

SILICON;

EID: 0036864193     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1513790     Document Type: Article

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